Growth mode study of MgCl2 on Au foil and Si (111) 7x7, under Ultra High Vacuum by XPS

Authors

  • S. Karakalos FORTH/Institute of Chemical Engineering and High Temperature Chemical Processes and Department of Chemical Engineering, University of Patras, Greece
Volume: 1 | Issue: 1 | Pages: 13-16 | February 2011 | https://doi.org/10.48084/etasr.4

Abstract

The growth mode of MgCl2 on Au foil and Si (111) 7x7 reconstructed surface under UHV conditions, was investigated by X-ray Photoelectron Spectroscopy (XPS). Magnesium chloride grows with the Frank-van der Merve, (FM) growth mode on the Au foil. On Si surface there is evidence for the layer by layer growth of MgCl2 but leaving uncovered silicon areas at the first steps of deposition due to the Si (111)7x7 surface roughness.

Keywords:

growth mode, MgCl2, Au foil, Si(111)7x7, UHV, XPS

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References

EP 297 824 A2, Shell Oil Company, invs R.F. Job; Chem Abstr., (1989), 110, 21363h

E. Magni, G.E. Somorjai , Surf. Sci. 345 (1996) 1-16 DOI: https://doi.org/10.1016/0039-6028(95)07393-0

S. Karakalos, A. Siokou, V. Dracopoulos, F. Sutara, T. Skala, M. Skoda, S. Ladas, K. Prince, V. Matolin, V. Chab, Journal of Chemical Physics 128, (2008), 104705 DOI: https://doi.org/10.1063/1.2888926

S. Karakalos, A. Siokou, F. Sutara, T. Skala, F. Vitaliy, S. Ladas, K. Prince, V. Matolin, V. Chab, Journal of Chemical Physics 133, (2010), 074701 DOI: https://doi.org/10.1063/1.3473933

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How to Cite

[1]
S. Karakalos, “Growth mode study of MgCl2 on Au foil and Si (111) 7x7, under Ultra High Vacuum by XPS”, Eng. Technol. Appl. Sci. Res., vol. 1, no. 1, pp. 13–16, Feb. 2011.

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